AsianScientist (Mar. 27, 2012) – A*STAR Institute of Microelectronics (IME) and Picosun Oy, a Finland-based global manufacturer of Atomic Layer Deposition (ALD) equipment, have announced a partnership to develop advanced ALD techniques in next generation memories and solar cells.
With this collaboration, IME and Picosun will jointly develop innovative ALD and plasma-enhanced ALD (PEALD) processes for novel dielectrics and metals for applications in resistive switching non-volatile memories (NVM), multilayer metal-insulator-metal (MIM) capacitors, solar cells, and advanced complementary-metal-oxide-semiconductors (CMOS).
“IME is continually engaging with strategic partners to enable breakthroughs in novel technologies,” says Prof. Dim-Lee Kwong, Executive Director of IME.
“Picosun’s state-of-the-art ALD technology and unparalleled expertise in the field will complement our expertise to spearhead new technologies and bring the results of our R&D to our partners rapidly.”
Enabling integration of the processes with the devices for industrial applications will be the core objective of the joint research project.
“We are excited to partner with IME to speed up the R&D of novel, groundbreaking semiconductor, IC and renewable energy technologies. Establishing the IME-Picosun partnership ties closely also to the recent opening of Picosun’s first Asian subsidiary, Picosun Asia Pte. Ltd. in Singapore,” said Mr. Kustaa Poutiainen, CEO of Picosun.
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Source: A*STAR.
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